{"id":904,"date":"2020-06-16T13:26:16","date_gmt":"2020-06-16T13:26:16","guid":{"rendered":"https:\/\/blog.pufsecurity.com\/?p=904"},"modified":"2023-11-30T03:10:12","modified_gmt":"2023-11-30T03:10:12","slug":"puf-series-3-the-quantum-tunneling-mechanism-of-neopuf","status":"publish","type":"dlp_document","link":"https:\/\/www.pufsecurity.com\/zh-hans\/document\/puf-series-3-the-quantum-tunneling-mechanism-of-neopuf\/","title":{"rendered":"PUF Series 3: The Quantum Tunneling Mechanism of NeoPUF"},"content":{"rendered":"\n<p style=\"font-size:16px\"><\/p>\n\n\n\n<p><\/p>\n\n\n\n<p style=\"font-size:16px\">In my\u00a0<a href=\"https:\/\/www.pufsecurity.com\/document\/neopuf-a-reliable-and-non-traceable-quantum-tunneling-puf\/\" target=\"_blank\" rel=\"noopener\" title=\"\">previous article<\/a>, I have briefly introduced the physics of\u00a0the\u00a0quantum tunneling behavior in\u00a0NeoPUF. In this article, I will explain,\u00a0in detail,\u00a0the\u00a0quantum-tunneling\u00a0mechanism\u00a0in the gate oxide of MOSFET in advanced silicon processes and how it applies\u00a0in the creation of\u00a0NeoPUF\u00a0characteristics.\u00a0\u00a0<\/p>\n\n\n\n<p style=\"font-size:16px\">I will use&nbsp;a&nbsp;two-dimensional cross&nbsp;section of&nbsp;a&nbsp;silicon dioxide atomic structure and&nbsp;a&nbsp;corresponding energy band diagram to explain trap-assisted electron tunneling.&nbsp;<\/p>\n\n\n\n<p style=\"font-size:16px\">Figure 1&nbsp;illustrates&nbsp;electron transport across silicon dioxide, from&nbsp;a&nbsp;silicon substrate to&nbsp;a&nbsp;metal gate. If there are many dangling bonds (either silicon dangling bonds or oxygen dangling bonds), due to quantum tunneling,&nbsp;an&nbsp;electron&nbsp;has&nbsp;a&nbsp;high probability&nbsp;of&nbsp;hopping&nbsp;from one dangling bond to another dangling bond,&nbsp;which&nbsp;contributes&nbsp;to electrical current. Whereas,&nbsp;as shown in&nbsp;Figure 2, in&nbsp;a&nbsp;structure with no dangling bond,&nbsp;an&nbsp;electron has&nbsp;a&nbsp;very&nbsp;small chance of&nbsp;jumping&nbsp;from&nbsp;a&nbsp;silicon substrate to&nbsp;a&nbsp;metal gate. The corresponding electron potential band diagram of metal-oxide-semiconductor of Figure 1 can be represented as&nbsp;seen&nbsp;in Figure 3.&nbsp;&nbsp;<\/p>\n\n\n\n<p style=\"font-size:16px\">As&nbsp;an&nbsp;electrical field is applied between&nbsp;the&nbsp;metal gate and&nbsp;the&nbsp;substrate, the electrons from the substrate can tunnel through the trap levels&nbsp;(dangling bonds) and transport to the gate. While the electron potential band diagram is illustrated in Figure 4, due to the lack of trap levels (dangling bonds),&nbsp;an&nbsp;electron in the substrate has&nbsp;to overcome&nbsp;a&nbsp;very high energy barrier to&nbsp;jump&nbsp;to the gate. Therefore, the conduction current in both cases&nbsp;will be very different. However, the difference in their microstructures&nbsp;is not&nbsp;possible to detect&nbsp;or&nbsp;trace&nbsp;physically by any means.&nbsp;&nbsp;<\/p>\n\n\n\n<p style=\"font-size:16px\">NeoPUF,&nbsp;a&nbsp;quantum-tunneling PUF,&nbsp;is&nbsp;formed by applying&nbsp;identical&nbsp;high electrical fields&nbsp;to a pair of adjacent MOSFETs&nbsp;that&nbsp;have variations in their oxide quality. Under the same&nbsp;voltage,&nbsp;an&nbsp;oxide&nbsp;that&nbsp;has more dangling bonds (worse quality) will be subjected to larger impact ionization by the electrons which are heated&nbsp;through an&nbsp;electronic field. These&nbsp;result in the generation of more dangling bonds&nbsp;as&nbsp;compared to&nbsp;an&nbsp;oxide with&nbsp;fewer&nbsp;initial dangling bonds. As the tunneling current&nbsp;flows&nbsp;through the oxide&nbsp;that&nbsp;has&nbsp;more dangling bonds&nbsp;at&nbsp;the sensing level,&nbsp;the&nbsp;PUF formation process ceases.&nbsp;&nbsp;<\/p>\n\n\n\n<p style=\"font-size:16px\">By using&nbsp;every two adjacent MOSFETS to repeat the process&nbsp;as&nbsp;above, a block of&nbsp;unpredictable and random&nbsp;numbers will be&nbsp;created&nbsp;because it is impossible to know&nbsp;which of&nbsp;two&nbsp;adjacent&nbsp;MOSFETs&nbsp;has&nbsp;a&nbsp;better&nbsp;oxide quality.&nbsp;&nbsp;<\/p>\n\n\n\n<p style=\"font-size:16px\">Once this formation is done, the set of random numbers is very reliable since the dangling bonds cannot be&nbsp;modified&nbsp;unless high temperature (&gt; 600 degrees Celsius) is applied. It will not be affected by variations&nbsp;in the&nbsp;environment such as noise, temperature and voltage&nbsp;variations,&nbsp;since these cannot&nbsp;modify&nbsp;the dangling bonds.&nbsp;&nbsp;<\/p>\n\n\n\n<p style=\"font-size:16px\">The stored data \u201c1\u201d and \u201c0\u201d depend on the tunneling current.&nbsp;Because&nbsp;there&nbsp;are&nbsp;no&nbsp;charges&nbsp;stored&nbsp;on the device,&nbsp;after the power is turned off,&nbsp;the PUF derived from this technique cannot be physically&nbsp;traced.&nbsp;&nbsp;<\/p>\n\n\n\n<p style=\"font-size:16px\">NeoPUF&nbsp;and its formation mechanism, quantum tunneling, have been proven in&nbsp;many&nbsp;processes&nbsp;at&nbsp;major silicon foundries. For&nbsp;those who are concerned about&nbsp;the security of their products&nbsp;and want&nbsp;to have high quality PUF-based security solutions,&nbsp;NeoPUF&nbsp;is&nbsp;proven&nbsp;in&nbsp;world-leading&nbsp;foundries to&nbsp;meet&nbsp;your security&nbsp;needs.&nbsp;&nbsp;<\/p>\n\n\n\n<p style=\"font-size:16px\">In my next article, I will&nbsp;describe&nbsp;the characteristics of&nbsp;NeoPUF&nbsp;and&nbsp;quantum tunneling PUF, including&nbsp;their&nbsp;uniqueness, randomness,&nbsp;reliability&nbsp;and non-traceability,&nbsp;following fabrication in&nbsp;major foundries.&nbsp;&nbsp;<\/p>\n\n\n<div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" decoding=\"async\" width=\"628\" height=\"354\" src=\"https:\/\/www.pufsecurity.com\/wp-content\/uploads\/2020\/06\/image.png\" alt=\"\" class=\"wp-image-1949\" srcset=\"https:\/\/www.pufsecurity.com\/wp-content\/uploads\/2020\/06\/image.png 628w, https:\/\/www.pufsecurity.com\/wp-content\/uploads\/2020\/06\/image-300x169.png 300w\" sizes=\"(max-width: 628px) 100vw, 628px\" \/><figcaption class=\"wp-element-caption\">Figure 1. Electron transport from&nbsp;Si&nbsp;substrate&nbsp;to metal gate through dangling bonds (oxide traps)&nbsp;<\/figcaption><\/figure><\/div>\n\n<div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" decoding=\"async\" width=\"628\" height=\"354\" src=\"https:\/\/www.pufsecurity.com\/wp-content\/uploads\/2020\/06\/image-3.png\" alt=\"\" class=\"wp-image-1948\" srcset=\"https:\/\/www.pufsecurity.com\/wp-content\/uploads\/2020\/06\/image-3.png 628w, https:\/\/www.pufsecurity.com\/wp-content\/uploads\/2020\/06\/image-3-300x169.png 300w\" sizes=\"(max-width: 628px) 100vw, 628px\" \/><figcaption class=\"wp-element-caption\">Figure 2. If no dangling bonds&nbsp;are&nbsp;in the oxide, the probability&nbsp;for&nbsp;an&nbsp;electron to transport in the oxide is very&nbsp;small.&nbsp;<\/figcaption><\/figure><\/div>\n\n<div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" decoding=\"async\" width=\"628\" height=\"354\" src=\"https:\/\/www.pufsecurity.com\/wp-content\/uploads\/2020\/06\/image-1.png\" alt=\"\" class=\"wp-image-1946\" srcset=\"https:\/\/www.pufsecurity.com\/wp-content\/uploads\/2020\/06\/image-1.png 628w, https:\/\/www.pufsecurity.com\/wp-content\/uploads\/2020\/06\/image-1-300x169.png 300w\" sizes=\"(max-width: 628px) 100vw, 628px\" \/><figcaption class=\"wp-element-caption\">Figure 3.&nbsp;Electron energy band diagram of MOS (metal-oxide semiconductor)&nbsp;to illustrate electron tunneling through&nbsp;a&nbsp;gate oxide if there are many&nbsp;dangling bonds (oxide traps) in the oxide.&nbsp;<\/figcaption><\/figure><\/div>\n\n<div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" decoding=\"async\" width=\"628\" height=\"354\" src=\"https:\/\/www.pufsecurity.com\/wp-content\/uploads\/2020\/06\/image-2.png\" alt=\"\" class=\"wp-image-1947\" srcset=\"https:\/\/www.pufsecurity.com\/wp-content\/uploads\/2020\/06\/image-2.png 628w, https:\/\/www.pufsecurity.com\/wp-content\/uploads\/2020\/06\/image-2-300x169.png 300w\" sizes=\"(max-width: 628px) 100vw, 628px\" \/><figcaption class=\"wp-element-caption\">Figure 4. Electron energy band diagram of MOS (metal-oxide semiconductor)&nbsp;to illustrate&nbsp;the difficulty&nbsp;for electrons to tunnel through the oxide&nbsp;if there are no traps in the oxide. The electrons need to gain enough energy&nbsp;to&nbsp;jump&nbsp;the barrier to enter the conduction bond of oxide&nbsp;and&nbsp;conduct.&nbsp;<\/figcaption><\/figure><\/div>\n\n\n<p><\/p>\n","protected":false},"excerpt":{"rendered":"<p>In my\u00a0previous article, I have briefly introduced the p [&hellip;]<\/p>\n","protected":false},"author":7,"featured_media":1864,"template":"","doc_tags":[203],"class_list":["post-904","dlp_document","type-dlp_document","status-publish","has-post-thumbnail","hentry","doc_categories-article","doc_tags-puf"],"acf":[],"aioseo_notices":[],"_links":{"self":[{"href":"https:\/\/www.pufsecurity.com\/zh-hans\/wp-json\/wp\/v2\/dlp_document\/904"}],"collection":[{"href":"https:\/\/www.pufsecurity.com\/zh-hans\/wp-json\/wp\/v2\/dlp_document"}],"about":[{"href":"https:\/\/www.pufsecurity.com\/zh-hans\/wp-json\/wp\/v2\/types\/dlp_document"}],"author":[{"embeddable":true,"href":"https:\/\/www.pufsecurity.com\/zh-hans\/wp-json\/wp\/v2\/users\/7"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.pufsecurity.com\/zh-hans\/wp-json\/wp\/v2\/media\/1864"}],"wp:attachment":[{"href":"https:\/\/www.pufsecurity.com\/zh-hans\/wp-json\/wp\/v2\/media?parent=904"}],"wp:term":[{"taxonomy":"doc_tags","embeddable":true,"href":"https:\/\/www.pufsecurity.com\/zh-hans\/wp-json\/wp\/v2\/doc_tags?post=904"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}